Tabletop ALD Equipment

Would your research benefit by having access to Thin Films grown by ALD? Until now, ALD tools have been too expensive for most Universities and Research Scientists. We’ve engineered a low cost table top solution to specifically address this niche.

Included with the AT400 (4”) ALD System:
- Deposition system with integrated controller
- Quick change flat sample holder with edge

guard (custom holders available)
- All exterior connections for precursor bottles,

process gasses, power, and vacuum.
- Proven Process Recipes for many materials

such as Al2O3, Pt, Ru, HfO2, TiO2, ZrO2,

ZnO, Al:ZnO,TiN…
- Documentation - Digital manual along with

training and maintenance videos available

online and by USB.
Warranty:
- 1 Year Parts & Labor
- Process Development Support
- Extendable Warranty Services
Options:
- Precursor bottles (empty) with shut-off valve
- Custom heater jackets for precursors
- Enhanced temperature control 35C—150C
- Inert gas pressure assist for low vapor

pressure precursors
- Vented precursor cabinet

System Highlights:
- Chamber designed and optimized for typical

R&D substrates (samples) up to 4” in diameter
- Fixture can be modified for specialty samples
- Chamber temperature range is RT to 350C
- Precursor temperatures can be managed by

optional heater jackets
- Process pressure is user adjustable from 0.1 to 1.5 Torr
- Up to 5ea ALD precursor sources:
- 3ea organometallic or other metal sources
- 2ea oxidants/reduction sources
- System is completely metal sealed upstream of

sample - Fast Cycling capability
- High aspect ratio deposition with excellent

conformal coverage
- Precise precursor dosing with defined dose

volumes
- Robust 6” touch screen PLC control system
- Simple and accessible system maintenance
- Safety interlocks
- Smallest footprint on the market

Tabletop ALD Equipment